To prevent this, a chemical filter for ammonia removal is used to remove ammonia from the air entering the spinner installation. That is, the pattern profile reacts very sensitively to the ammonia concentration in the installation, and when the ammonia concentration exceeds the reference value, the pattern profile becomes poor. Field of the Invention The present invention relates to spinner installations used in photo processes in semiconductor device manufacturing processes, and more particularly to spinner installations having an acyclic air conditioning system for controlling ammonia concentrations.
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